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VeTek semiconductor Technology Co., LTD

Products >> EPI Susceptor Parts

EPI Susceptor Parts

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Product Name: EPI Susceptor Parts
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Veteksemicon EPI Susceptor Part core advantages


1. Ensure ultimate uniformity

In silicon carbide epitaxial processes, even micron-level thickness fluctuations and doping inhomogeneities directly i***ct the performance and yield of the final device. Veteksemicon EPI Susceptor achieves optimal thermal field distribution within the reaction chamber through precise thermodynamic simulation and structural design. Our selection of a high thermal conductivity substrate, combined with a unique surface treatment process, ensures that temperature differences at any point on the wafer's surface are controlled within an extremely small range even under high-speed rotation and high-temperature environments. The direct value this brings is a highly reproducible, batch-to-batch epitaxial layer with excellent uniformity, laying a solid foundation for manufacturing high-performance, highly consistent power chips.



2. Resisting the challenge of high temperatures

SiC epitaxial processes typically require prolonged operation at temperatures exceeding 1500℃, posing a severe challenge to any material. Veteksemicon Susceptor utilizes specially treated isostatically pressed graphite, whose high-temperature flexural strength and creep resistance far surpass those of ordinary graphite. Even after hundreds of hours of continuous high-temperature thermal cycling, our product maintains its initial geometry and mechanical strength, effectively preventing wafer warpage, slippage, or process cavity contamination risks caused by tray deformation, fundamentally ensuring the continuity and safety of production activities.



3. Maximize process stability

Production interruptions and unplanned maintenance are major cost killers in wafer manufacturing. Veteksemicon considers process stability a core metric for Susceptor. Our patented CVD SiC coating is dense, non-porous, and has a mirror-like smooth surface. This not only significantly reduces particle shedding under high-temperature airflow but also significantly slows th

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Company: VeTek semiconductor Technology Co., LTD
Contact: Ms. Andy Year
Address: Wangda Road, Ziyang Street, Wuyi County, Jinhua City, Zhejiang Province, China
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Tel: 15300650061
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